1990s

Click here to get pdf files for these publications (internal EMAT user only)

  • K. Wada, T. Chen, J. Michel, L. C. Kimerling, H. Aga, K. Mitani, T. Abe and M. Suezawa,
    "Photonic bandgap formation by wafer bonding and delamination," Iii-V and Iv-Iv Materials and Processing
    Challenges for Highly Integrated Microelectronics and Optoelectronics, 535 (1999).

 

  • A. L. Smith, S. T. Dunham and L. C. Kimerling, "Transition metal defect behavior and Si
    density of states in the processing temperature regime," Physica B, 274 (1999).

 

  • J. Reddy, J. V. Chan, T. A. Burr, R. Mo, C. P. Wade, C. E. D. Chidsey, J. Michel and L. C. 
    Kimerling, "Defect states at silicon surfaces," Physica B, 274 (1999).

 

  • G. Masini, L. Colace, G. Assanto, H. C. Luan, K. Wada and L. C. Kimerling, "High
    responsitivity near infrared Ge photodetectors integrated on Si," Electronics Letters, 35 17 (1999).

 

 

 

 

  • L. C. Kimerling,
    "Silicon materials engineering for the next millennium," Solid State Phenomena, 70 (1999).

 

  • T. Gregorkiewicz, D. T. X. Thao, I. Tsimperidis, H. Bekman, C. Langerak, J. Michel
    and L. C. Kimerling, "Excitation mechanism of Er in Si studied with a free-electron
    laser," Light Emission from Silicon: Progress Towards Si-Based Optoelectronics, 77 (1999).

 

  • V. V. Emtsev, D. S. Poloskin, E. I. Shek, N. A. Sobolev, J. Michel and L. C.
    Kimerling, "Impurity effects in silicon implanted with rare-earth
    ions," Physica B, 274 (1999).

 

  • V. V. Emtsev, V. V. Emtsev, D. S. Poloskin, N. A. Sobolev, E. I. Shek, J. Michel and
    L. C. Kimerling, "Impurity centers in silicon doped with rare-earth
    impurities of dysprosium, holmium, erbium and ytterbium," Semiconductors, 33 6 (1999).

 

  • V. V. Emtsev, V. V. Emtsev, D. S. Poloskin, E. I. Shek, N. A. Sobolev, J. Michel and
    L. C. Kimerling, "Rare earth impurities and impurity-related centers in
    silicon," Solid State Phenomena,
    70 (1999).

 

  • V. V. Emtsev, V. V. Emtsev, D. S. Poloskin, E. I. Shek, N. A. Sobolev, J. Michel and
    L. C. Kimerling, "Oxygen and Erbium related donor centers in Czochralski
    grown silicon implanted with erbium," Semiconductors,
    33 10 (1999).

 

  • V. V. Emtsev, V. V. Emtsev, D. S. Poloskin, E. I. Shek, N. A. Sobolev, J. Michel and
    L. C. Kimerling, "Impurity effects in silicon implanted with rare-earth
    ions," Physica B, 274 (1999).

 

  • T. D. Chen, M. Platero, M. Opher-Lipson, J. Palm, J. Michel and L. C. Kimerling, "The
    temperature dependence of radiative and nonradiative processes at Er-O centers
    in Si," Physica B, 274 (1999).

 

  • K. M. Chen, A. W. Sparks, H. C. Luan, D. R. Lim, K. Wada and L. C. Kimerling,
    "SiO2/TiO2 omnidirectional reflector and microcavity resonator via the
    sol-gel method," Applied Physics
    Letters, 75 24 (1999).

 

  • R. B. Capaz, L. V. C. Assali, L. C. Kimerling, K. Cho and J. D. Joannopoulos,
    "Mechanism for hydrogen-enhanced oxygen diffusion in silicon," Physical Review B, 59 7 (1999).

 

  • R. B. Capaz, L. V. C. Assali, L. C. Kimerling, K. Cho and J. D. Joannopoulos, "Ab
    initio studies of hydrogen-enhanced oxygen diffusion in silicon," Brazilian Journal of Physics, 29 4 (1999).

 

  • A. Agarwal, J. S. Foresi, L. M. Giovane, L. Liao, J. Michel, K. Wada and L. C. Kimerling,
    "Defect engineering for silicon microphotonics," Proceedings of the Third International Symposium on Defects in Silicon,
    99 1 (1999).

 

  • S. Zhao and L. C. Kimerling, "Defect reactions induced by reactive ion etching," Semiconductor Process and Device Performance
    Modelling, 490 (1998).

 

  • K. Wada, H. Nakanishi, K. Yamada and L. C. Kimerling, "Electronically enhanced
    reaction of process-induced defects in GaAs," Defect and Impurity Engineered Semiconductors Ii, 510 (1998).

 

  • A. L. Smith, S. H. Ahn and L. C. Kimerling, "A gettering simulator: Polished wafers and
    p/p(++) epilayers," Silicon Materials Science and Technology, Vols 1 and 2, (1998).

 

  • G. J. Norga, M. Platero, K. A. Black, A. J. Reddy, J. Michel and L. C. Kimerling,
    "Detection of metallic contaminants on silicon by surface sensitive
    minority carrier lifetime measurements," Journal of the Electrochemical Society, 145 7 (1998).

 

  • J. Michel, L. V. C. Assali, M. T. Morse and L. C. Kimerling, "Erbium in
    silicon," Light Emission in Silicon:
    from Physics to Devices, 49 (1998).

 

  • E. Little, H. A. Haus, J. S. Foresi, L. C. Kimerling, E. P. Ippen and D. J. Ripin,
    "Wavelength switching and routing using absorption and resonance," Ieee Photonics Technology Letters, 10 6 (1998).

 

 

  • E. Little, J. S. Foresi, G. Steinmeyer, E. R. Thoen, S. T. Chu, H. A. Haus, E. P. Ippen,
    L. C. Kimerling and W. Greene, "Ultra-compact Si-SiO2 microring resonator optical channel dropping filters," Ieee Photonics Technology Letters, 10 4 (1998).

 

  • B. Little, H. Haus, E. Ippen, G. Steinmeyer, E. Thoen, J. Foresi, L. Kimerling, S. T. Chu and W. Greene, "Microresonators for Integrated Optical Devices," Optics and Photonics News, 9 12 (1998).

 

  • L. C. Kimerling, "The Economics of Science: From Photons to Products," Optics and Photonics News, 9 10 (1998).

 

  • T. Gregorkiewicz, D. T. X. Thao, I. Tsimperidis, H. H. P. T. Bekman, C. J. G. M.
    Langerak, J. Michel and L. C. Kimerling, "Excitation mechanism of Er in Si
    studied with a free-electron laser," Journal
    of Luminescence, 80 1-4 (1998).

 

  • L. M. Giovane, D. R. Lim, S. H. Ahn, T. D. Chen, J. S. Foresi, L. Liao, E. J.
    Oulette, A. M. Agarwal, X. Duan, J. Michel, A. Thilderkvist and L. C.
    Kimerling, "Materials for monolithic silicon microphotonics," Materials and Devices for Silicon-Based
    Optoelectronics, 486 (1998).

 

 

  • T. D. Chen, A. M. Agarwal, L. M. Giovane, J. S. Foresi, L. Liao, D. R. Lim, M. T. Morse, E. J. Ouellette, S. H. Ahn, X. M. Duan, J. Michel and L. C. Kimerling, "Erbium-doped silicon light emitting devices," Proc. SPIE 3279, 136 (1998).

 

  • S. Zhao, A. L. Smith, S. H. Ahn, G. J. Norga, M. T. Platero, H. Nakashima, L. V. C. Assali,
    J. Michel and L. C. Kimerling, "Iron in p-type silicon: A comprehensive model," Defects in Semiconductors – Icds-19, Pts 1-3, 258-2 (1997).

 

  • S. Zhao, A. M. Agarwal, J. L. Benton, G. H. Gilmer and L. C. Kimerling, "Interstitial
    defect reactions in silicon," Defects in Electronic Materials Ii, 442 (1997).

 

  • A. J. Reddy, G. J. Norga, A. S. Park, A. L. Smith, J. Michel, L. C. Kimerling, B. Parekh, J.
    H. Shyu and E. Deane, "In-situ monitoring of HF reprocessing in an industrial scale recirculator bath," Environmental,
    Safety and Health Issues in Ic Production, 447 (1997).

 

  • J. Reddy, T. A. Burr, J. K. Chan, G. J. Norga, J. Michel and L. C. Kimerling, "Silicon
    surface defects: The roles of passivation and surface contamination," Defects in Semiconductors – Icds-19, Pts 1-3,
    258-2 (1997).

 

  • G. J. Norga, M. Platero, K. A. Black, A. J. Reddy, J. Michel and L. C. Kimerling,
    "Mechanism of copper deposition on silicon from dilute hydrofluoric acid
    solution," Journal of the Electrochemical Society, 144 8 (1997).

 

  • J. Michel, A. J. Reddy, G. J. Norga, M. Platero and L. C. Kimerling, "In-situ
    determination of Si wafer contamination using photoconductance decay measurements,"
    Proceedings of the Electrochemical Society Symposium on Diagnostic Techniques for Semiconductor Materials and
    Devices, 97 12 (1997).

 

  • J. Michel, J. Palm, T. Chen, X. Duan, E. Ouellette, S. H. Ahn, S. F. Nelson and L. C.
    Kimerling, "Energy transfer processes at erbium ions in silicon," Defects in Semiconductors – Icds-19, Pts 1-3,
    258-2 (1997).

 

  • L. C. Kimerling, K. D. Kolenbrander, J. Michel and J. Palm, "Light emission from
    silicon," Solid State Physics – Advances in Research and Applications, Vol 50, 50 (1997).

 

 

  • L. C. Kimerling, "Design: New material challenge for silicon ULSI," Solid State Phenomena, 57-8 (1997).

 

  • L. M. Giovane, L. Liao, D. R. Lim, A. M. Agarwal, E. A. Fitzgerald and L. C.
    Kimerling, "Si0.5Ge0.5 relaxed buffer photodetectors and low-loss
    polycrystalline silicon waveguides for integrated optical interconnects at
    lambda=1.3 mu m," Silicon-Based Monolithic and Hybrid Optoelectronic Devices, 3007 (1997).

 

  • J. S. Foresi, P. R. Villeneuve, J. Ferrera, E. R. Thoen, G. Steinmeyer, S. Fan, J. D.
    Joannopoulos, L. C. Kimerling, H. I. Smith and E. P. Ippen,
    "Photonic-bandgap microcavities in optical waveguides," Nature, 390 6656 (1997).

 

 

  • X. Duan, J. Palm, B. Zheng, M. Morse, J. Michel and L. C. Kimerling, "Defects in
    erbium/oxygen implanted silicon," Defects in Electronic Materials Ii, 442 (1997).

 

  • S. H. Ahn, S. Zhao, A. L. Smith, L. L. Chalfoun, M. Platero, H. Nakashima and L. C.
    Kimerling, "Gettering of Fe by aluminum in p-type Cz silicon," Defects in Electronic Materials Ii, 442 (1997).

 

 

  • A. Thilderkvist, J. Michel, S. T. Ngiam, L. C. Kimerling and K. D. Kolenbrander, "Room
    temperature emission from erbium nanoparticles embedded in a silicon
    matrix," Surface/Interface and Stress Effects in Electronic Materials Nanostructures, 405 (1996).

 

  • J. Palm, F. Gan, B. Zheng, J. Michel and L. C. Kimerling, "Electroluminescence of
    erbium-doped silicon," Physical Review B, 54 24 (1996).

 

 

  • Morse, B. Zheng, J. Palm, X. Duan and L. C. Kimerling, "Properties of ion implanted and UHV-CVD grown Si:Er," Rare Earth
    Doped Semiconductors Ii, 422 (1996).

 

  • J. Michel, B. Zheng, J. Palm, E. Ouellette, F. Gan and L. C. Kimerling, "Erbium doped silicon for light emitting devices," Rare
    Earth Doped Semiconductors Ii, 422 (1996).

 

  • L. C. Kimerling, J. Michel, H. Msaad and G. J. Norga, "Microdefect analysis of
    silicon: Tools and strategies," Semiconductor Characterization, (1996).

 

  • J. S. Foresi, M. R. Black, A. M. Agarwal and L. C. Kimerling, "Losses in
    polycrystalline silicon waveguides," Applied Physics Letters, 68 15 (1996).

 

  • L. Chalfoun, G. Norga, S. Zhao and L. C. Kimerling, "In-line materials quality monitor
    for crystalline silicon solar cell fabrication," 13th Nrel Photovoltaics Program Review, 353 (1996).

 

  • A. M. Agarwal, L. Liao, J. S. Foresi, M. R. Black, X. M. Duan and L. C. Kimerling,
    "Low-loss polycrystalline silicon waveguides for silicon photonics," Journal of Applied Physics, 80 11 (1996).

 

  • M. Agarwal, M. R. Black, J. S. Foresi, L. Liao, Y. P. Liu and L. C. Kimerling,
    "Polysilicon waveguides for silicon photonics," Polycrystalline Thin Films: Structure, Texture, Properties and
    Applications Ii, 403 (1996).

 

  • S. Zhao, L. V. C. Assali and L. C. Kimerling, "The structure and bonding of
    iron-acceptor pairs in silicon," Icds-18 – Proceedings of the 18th International Conference on Defects in
    Semiconductors, Pts 1-4, 196- (1995).

 

  • K. Wada, H. Nakanishi and L. C. Kimerling, "Reactivation of Si donors and Zn acceptors
    in plasma-irradiated GaAs by reverse BiAs annealing," Icds-18 – Proceedings of the 18th International Conference on Defects
    in Semiconductors, Pts 1-4, 196- (1995).

 

  • J. Palm and L. C. Kimerling, "Defects and future silicon technology," Defect and Impurity Engineered Semiconductors
    and Devices, 378 (1995).

 

  • G. J. Norga and L. C. Kimerling, "Metal Removal from Silicon Surfaces in Wet
    Chemical-Systems," Journal of Electronic Materials, 24 4 (1995).

 

  • G. J. Norga, M. R. Black, K. A. Black, H. Msaad, J. Michel and L. C. Kimerling, "High
    sensitivity detection of silicon surface reactions by photoconductance
    decay," Icds-18 – Proceedings of the 18th International Conference on Defects in Semiconductors, Pts 1-4, 196- (1995).

 

  • G. J. Norga, K. A. Black, H. Msaad, J. Michel and L. C. Kimerling, "Simulation and
    In-Situ Monitoring of Metallic Contamination and Surface Roughening in Wet
    Wafer Cleaning Solutions," Materials Science and Technology, 11 1 (1995).

 

  • H. Msaad, J. Michel, A. Reddy and L. C. Kimerling, "Monitoring and Optimization of
    Silicon Surface Quality," Journal of the Electrochemical Society, 142 8 (1995).

 

  • J. Michel, J. Palm, F. Gan, F. Y. G. Ren, B. Zheng, S. T. Dunham and L. C. Kimerling,
    "Erbium in silicon: A defect system for optoelectronic integrated circuits," Icds-18 – Proceedings of
    the 18th International Conference on Defects in Semiconductors, Pts 1-4, 196- (1995).

 

 

  • L. C. Kimerling, "The Journal Talks with 1994 TMS President Kimerling, Lionel
    C.," Jom-Journal of the Minerals Metals & Materials Society, 47 2 (1995).

 

  • Gan, L. V. C. Assali and L. C. Kimerling, "Electronic structure of erbium centers in
    silicon," Icds-18 – Proceedings of the 18th International Conference on Defects in Semiconductors, Pts 1-4, 196- (1995).

 

  • Frear, J. P. Hirth, J. K. Howard, L. C. Kimerling and B. Wessels, "Experts Consider the
    Future of Electronic Materials," Jom-Journal of the Minerals Metals & Materials Society, 47 3 (1995).

 

  • Zheng, J. Michel, F. Y. G. Ren, L. C. Kimerling, D. C. Jacobson and J. M. Poate,
    "Room-Temperature Sharp Line Electroluminescence at Lambda=1.54-Mu-M from
    an Erbium-Doped, Silicon Light-Emitting Diode," Appl. Phys. Lett., 64 21 (1994).

 

  • Y. G. Ren, J. Michel, D. C. Jacobson, J. M. Poate and L. C. Kimerling,
    "Fluorine-Enhanced Si-Er Light-Emission," Materials Synthesis and Processing Using Ion Beams, 316 (1994).

 

  • H. Msaad, G. J. Norga, J. Michel and L. C. Kimerling, "Defect Monitoring And Control
    For Crystalline Silicon Processing," 12th Nrel Photovoltaic Program Review, 306 (1994).

 

  • H. Msaad, J. Michel, J. J. Lappe and L. C. Kimerling, "Electronic Passivation of
    Silicon Surfaces by Halogens," Journal of Electronic Materials, 23 5 (1994).

 

  • J. Michel, F. Y. G. Ren, B. Zheng, D. C. Jacobson, J. M. Poate and L. C. Kimerling,
    "The Physics and Application of Sier for Light-Emitting-Diodes," Proceedings of the 17th International
    Conference on Defects in Semiconductors, Pts 1-3, 143- (1994).

 

  • N. Yassievich and L. C. Kimerling, "The Mechanisms of Electronic Excitation
    of Rare-Earth Impurities in Semiconductors," Semiconductor Science and Technology, 8 5 (1993).

 

  • A. Rohatgi, E. R. Weber and L. C. Kimerling, "Opportunities in Silicon Photovoltaics
    and Defect Control in Photovoltaic Materials," Journal of Electronic Materials, 22 1 (1993).

 

  • Y. G. Ren, J. Michel, Q. Sunpaduano, B. Zheng, H. Kitagawa, D. C. Jacobson, J. M. Poate
    and L. C. Kimerling, "IC Compatible Processing of Si-Er for Optoelectronics," Silicon-Based
    Optoelectronic Materials, 298 (1993).

 

  • Y. G. Ren, J. Michel, Q. Sunpaduano, B. Zheng, H. Kitagawa, D. C. Jacobson, J. M. Poate
    and L. C. Kimerling, "IC Compatible Processing of Si-Er for Optoelectronics," Rare Earth Doped
    Semiconductors, 301 (1993).

 

  • Michel, L.C. Kimerling, J. L. Benton, D. J. Eaglesham, E. A. Fitzgerald, D. C. Jacobson,
    J. M. Poate, Y. H. Xie and R. F. Ferrante, "Dopant Enhancement of the 1.54
    Mu-M Emission of Erbium Implanted in Silicon," Proceedings of the 16th International Conference on Defects in
    Semiconductors, Pts 1-3, 83 (1992).

 

  • Michel, E.A. Fitzgerald, Y. H. Xie, P. J. Silverman, M. Morse and L. C. Kimerling,
    "Photoluminescence Investigations of Graded, Totally Relaxed GexSi1-x
    Structures," Journal of Electronic Materials, 21 12 (1992).

 

  • S. Mahajan and L. C. Kimerling, "Concise encyclopedia of semiconducting materials
    & related technologies," 1st, Oxford ; New York, Pergamon Press, 1992.

 

  • Kitagawa, L C. Kimerling and S. Tanaka, "Iron-Related Levels in Normal-Type Silicon
    Studied by Hall-Effect and DLTS Measurements," Journal of Electronic Materials, 21 8 (1992).

 

  • C. Kimerling, "Fundamentals of Semiconductor Processing," Crucial Issues in Semiconductor Materials and Processing Technologies,
    222 (1992).

 

  • L. Benton, B. E. Weir, D. J. Eaglesham, R. A. Gottscho, J. Michel and L. C. Kimerling,
    "Measurement of Defect Profiles in Reactive Ion Etched Silicon," Journal of Vacuum Science & Technology B,
    10 1 (1992).

 

  • L. Benton, M. A. Kennedy, J. Michel and L. C. Kimerling, "Interstitial Defect
    Reactions in Silicon Processed by Reactive Ion Etching," Proceedings of the 16th International
    Conference on Defects in Semiconductors, Pts 1-3, 83 (1992).

 

 

 

  • A. Fitzgerald, P. E. Freeland, M. T. Asom, W. P. Lowe, R. A. Macharrie, B. E.
    Weir, A. R. Kortan, F. A. Thiel, Y. H. Xie, A. M. Sergent, S. L. Cooper, G. A.
    Thomas and L. C. Kimerling, "Epitaxially Stabilized GexSn1-x Diamond Cubic
    Alloys," Journal of Electronic Materials, 20 6 (1991).

 

  • J. Eaglesham, J. Michel, E. A. Fitzgerald, D. C. Jacobson, J. M. Poate, J. L.
    Benton, A. Polman, Y. H. Xie and L. C. Kimerling, "Microstructure of
    Erbium-Implanted Si," Applied Physics Letters, 58 24 (1991).

 

  • Chou, H. S. Chen, A. R. Kortan, L. C. Kimerling, F. A. Thiel and M. K. Wu, "Processing
    of a Tlba2Ca2Cu3Oy Superconducting Film by Liquid-Gas Solidification," Appl. Phys. Lett., 58 24 (1991).

 

  • J. L.Benton, J. Michel, L. C. Kimerling, B. E. Weir and R. A. Gottscho, "Carbon
    Reactions in Reactive Ion Etched Silicon," Journal of Electronic Materials, 20 9 (1991).

 

  • J. L.Benton, J. Michel, L. C. Kimerling, D. C. Jacobson, Y. H. Xie, D. J. Eaglesham,
    E. A. Fitzgerald and J. M. Poate, "The Electrical and Defect Properties of
    Erbium-Implanted Silicon," Journal of Applied Physics, 70 5 (1991).

 

  • J. Sanchez,A. H. King, T. Sands, J. R. Lloyd and L. C. Kimerling, "Metallizations for
    Electronics Applications – Forward," Journal of Electronic Materials, 19 11 (1990).

 

  • J. Michel, J. Jeong, K. M. Lee and L. C. Kimerling, "The Role of Oxygen in p-Type
    InP," Impurities, Defects and Diffusion in Semiconductors : Bulk and Layered Structures, 163 (1990).

 

  • J. Michel, J. L. Benton, J. Jeong, K. M. Lee, E. M. Monberg and L. C. Kimerling,
    "Oxygen Related Defect Reactions in InP," Journal of Electronic Materials, 19 7 (1990).

 

  • C.Kimerling, G. H. Gilmer and J. L. Benton, "The Diffusion of Iron in Silicon," Journal of Electronic
    Materials, 19 7 (1990).

 

  • A. Katz, D. Maher, P. M. Thomas, B. E. Weir, W. C. Dautremontsmith and L. C. Kimerling,
    "Microstructure, Stress and Electrical-Properties of the Highly Stable W/P+-In0.53Ga0.47As Ohmic Contacts," Beam-Solid Interactions : Physical Phenomena, 157 (1990).

 

  • Katz, W. C. Dautremontsmith, S. N. G. Chu, S. J. Pearton, M. Geva, B. E. Weir, P. M. Thomas
    and L. C. Kimerling, "Process Design for Nonalloyed Contacts to InP-Based Laser Devices," Advanced
    Metallization in Microelectronics, 181 (1990).

 

  • J. L.Benton, J. Michel, D. C. Jacobson, R. A. Gottscho and L. C. Kimerling,
    "Carbon Reactions in Implanted and Reactive Ion Etched Silicon," Journal of Electronic Materials, 19 7 (1990).

 

  • K. E. Benson, L. C. Kimerling and P. T. Panousis, "Reaching the Limits in
    Silicon Processing," AT&T Technical Journal, 69 6 (1990).